Efficient Algorithms for Three-Dimensional Etching and Deposition Simulation

نویسندگان

  • W. Pyka
  • S. Selberherr
چکیده

The reduction of computing time without loss of accuracy is a very important task for three-dimensional process simulators. We present new approaches for fast and stable simulation of etching and deposition processes by introducing nonspherical structuring element algorithms.

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تاریخ انتشار 2007